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China Successfully Developed “Zero Damage” Mega-Sound-Wave Semiconductor Cleaning Equipment
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| 2009-04-13 |
At the ongoing China International Semiconductor Exhibition in Shanghai, Shengmei Semiconductor Equipment (Shanghai) Co., Ltd. exhibited a 12-inch single-wafer mega-sound-wave washer, which represents the domestic-first “zero damage” mega-sound-wave semiconductor cleaning equipment with independent intellectual property rights.
At present, the greatest technical difficulty in cleaning semiconductors lies in controlling the fraction defective and mechanical damages. As the sizes of semiconductor chips are constantly getting smaller, the particles affecting the qualification rate for chips are also becoming smaller and therefore more difficult to clean; meanwhile, for chips below 65nm, their gate electrodes and capacitance structures are getting increasingly weak, and thus the difficulty in preventing damage to the microstructure of the chip in the washing process is also increasing.
As an emerging technology, the mega-sound-wave cleaning technology is finding wider application to semiconductor cleaning equipment. Dr. Wang Hui, CEO of Shengmei Semiconductor, points out that the mega-sound-wave energy can remove particles, because the mega sound wave can generate air pockets and they can further produce a high-velocity fluid on the “electrode surface”, so as to drive micro-particles away from the surface of the silicon chip. The key point of the technology lies in how to guarantee sufficient mega-sound-wave energy for generating air pockets on the chip surface, and at the same time, protect the microstructure on the surface of the silicon chip against damage by excessive energy.
According to Dr. Wang, in general, existing single-chip mega-sound-wave cleaning equipment in the global market can only control the non-uniformity degree of the mega-sound-wave energy with the range between 10% and 20%, whereas the SAPS mega-sound-wave technology developed by Shengmei Semiconductor independently can precisely control mega-sound-wave energy and limit its non-uniformity degree to 2%. As a result, if super-purified water is used, without causing damage to the microstructure, the mega-sound-wave equipment can guarantee a maximum particle-removing rate of 98.3%; and if a specific chemical cleaning fluid is used, such rate can reach up to 99.2%.
Source:Xinhua Network |
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